Welina mai i kā mākou mau pūnaewele!

AlSiCu Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Aluminum Silicon Copper

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

AlSiCu

Huina

Aluminum kilika keleawe

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤2000mm,W≤200mm


Huahana Huahana

Huahana Huahana

Hana ʻia ka Aluminum Silicon Copper alloy ma ke ʻano o ka hoʻoheheʻe ʻana a me ka ʻenehana deformation.Loaʻa iā ia ka maʻemaʻe kiʻekiʻe, ka microstructure homogeneous a me ka nui o ka palaoa i hoʻomaʻemaʻe ʻia a hoʻohana ʻia i ka nui o nā noi a me nā ʻoihana, me ka PVD coating, vacuum furnace component, X ray sputtering targets.ʻO ia hoʻi nā mea uhi no ka Large Scale Integrated Circuit no kāna hui kūʻokoʻa o nā hiʻohiʻona i makemake ʻia, me ke kaumaha māmā, ka conductivity thermal maikaʻi, ka paʻakikī, ka paʻakikī a me ka pale ʻana i ka corrosion.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hoʻoheheʻe alumini keleawe keleawe e like me nā kikoʻī o nā mea kūʻai aku.ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, ka hoʻolālā homogeneous, ka ʻili poli ʻole me ka hoʻokaʻawale ʻole, nā pores a me nā māwae.No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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