Welina mai i kā mākou mau pūnaewele!

CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Chromium Aluminum

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

CrAl

Huina

Chromium Aluminum

Maemae

99.7%,99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

ʻO ka hoʻoheheʻe ʻia ʻana o ka ʻuala, PM

Nui Loaʻa

L≤2000mm,W≤200mm


Huahana Huahana

Huahana Huahana

ʻO ka hana ʻana o Chromium Aluminum Sputtering Targets e pili ana i nā pae aʻe:

1. ʻO ka pauka wili a me ka hui ʻana.

2. Hot isostatic kaomi lapaʻau e kiʻi semi-hoʻopau huahana.

3. Ka hana 'ana i ka chromium aluminum alloy sputtering target material no ka loa'a 'ana o ka chromium aluminum alloy sputtering target material.

I ka wā o ke kaʻina hana hoʻopaʻa ʻana o nā pahuhopu CrAl sputtering, ua hoʻokumu ʻia kahi pale Aluminium-Chrom-Nitrid (AlCrN) paʻakikī.Hōʻike kēia uhi i ka paʻakikī kiʻekiʻe a me nā waiwai kūʻē o ka oxidation a hiki i ka wela kiʻekiʻe.Hiki i nā mea ʻoki ke holo i nā meaʻai kiʻekiʻe e hoʻonui i ka huahana a hoʻonui i ka maikaʻi i ka wā e hoʻohana ai i nā mīkini CNC.

ʻO kā mākou mau pahuhopu AlCr maʻamau a me kā lākou mau waiwai

Cr-70Alma%

Cr-60Alma%

Cr-50Alma%

Maʻemaʻe (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

ʻO ka mānoanoag/cm3

3.7

4.35

4.55

Gua Nui(µm)

100/50

100/50

100/50

Kaʻina hana

HIP

HIP

HIP

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea alumini Chromium Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku.ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, ka hoʻolālā homogeneous, ka ʻili poli ʻole me ka hoʻokaʻawale ʻole, nā pores a me nā māwae.No ka 'ike hou aku, e 'olu'olu e leka uila mai.


  • Mua:
  • Aʻe: