Welina mai i kā mākou mau pūnaewele!

Cunimn Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Manganese nikela keleawe

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

CuNiMn

Huina

Manganese nikela keleawe

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤2000mm,W≤200mm


Huahana Huahana

Hana ʻia ka pahu hoʻoheheʻe ʻana o Copper Nickel Manganese ma o ka hoʻoheheʻe ʻana.Hōʻike ia i ka maʻemaʻe kiʻekiʻe a me ka conductivity uila a hiki ke hoʻohana ʻia i ka ʻoihana hōʻike panel.

Loaʻa maʻamau ʻo Copper Nickel Manganese alloy nickel content 2%~44%, manganese content 0.1%~28% a me Copper koena.Hōʻike ka Manganese i ka solubility paʻa paʻa i ke keleawe a he mea hoʻoikaika paʻa ikaika.Hiki iā ia ke hoʻomaikaʻi i nā waiwai o ka alloy.

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hana Copper Nickel Manganese Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku.No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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