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Iron Cobalt Tantalum

FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

ʻO ka wehewehe pōkole:

Māhele	Alloy Sputtering Target
ʻO ke kimekema	FeCoTa
Huina	Iron Cobalt Tantalum
Maemae	99.9%，99.95%，99.99%
Kinohi	ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau
Kaʻina Hana Hana	ʻO ka hoʻoheheʻe ʻia ʻana o ka ʻuala, PM
Nui Loaʻa	L≤200mm，W≤200mm

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

Loaʻa nā pahu pahu hao Cobalt Tantalum ma ke ʻano pōʻai a me nā mea kiʻiʻoniʻoni lahilahi koʻikoʻi o ka media hoʻopaʻa leo magnetic vertical.ʻO ka nui o ka Tantalum i loaʻa i loko o ka huila e hopena i ka hoʻokaʻawale ʻana a hōʻike i nā mea i hoʻoheheʻe ʻole ʻia.Hoʻohana mākou i ke ʻano hana kūʻokoʻa e hiki ai ke hōʻoia i ka homogeneity o ka microstructure a hoʻomaikaʻi i nā waiwai mechanical o nā mea.

Inoa mea kūʻai		FeCoTa
Fe/wt%		Kaulike	Kaulike	Kaulike
Co/wt%		21.6±0.5	21.9±0.5	20.2±0.5
Ta/wt%		41.1±0.8	39.4±0.8	44.3±0.8
Maʻiʻo haumia metala（ppm）	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Maʻiʻo haumia kinoea（ppm）	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i ka Iron Cobalt Tantalum Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku.No ka 'ike hou aku, e 'olu'olu e leka uila mai.

Mua: FeCo Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Aʻe: FeSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made