FeTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made
Tantalum hao
ʻO ka wehewehe ʻana o ka Iron Tantalum Sputtering Target
ʻO ka hao Tantalum alloy kahi mea kūpono no nā kumu evaporation, nā paipu electron, nā mea prosthetic, a me nā mea hoʻoponopono.Hoʻohana mākou i ka ʻenehana kiʻekiʻe o ka hoʻolei ʻana a me ka paʻa paʻa ʻana e kiʻi i ka alloy Fe-Ta me ka hoʻomaʻemaʻe kiʻekiʻe a me ke ʻano homogenous.ʻO ka pahuhopu a mākou e hoʻopuka ai he mau waiwai mechanical maikaʻi loa ia a hiki ke hana i nā papa ʻili i hoʻomaʻemaʻe ʻia.
ʻO ka Iron Tantalum Sputtering Target Packaging
ʻO kā mākou Iron Tantalum sputter pahu hopu ʻia a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi.Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.
Loaʻa i ka Hoʻokaʻaʻike
ʻO RSM's Iron Tantalum sputtering targets he ultra-high clean and uniform.Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai.
Hiki iā mākou ke hoʻolako i nā ʻano geometric like ʻole: tubes, arc cathodes, planar a i hana maʻamau.Hōʻike kā mākou huahana i nā waiwai mechanical maikaʻi loa, microstructure homogeneous, ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores, a me nā māwae.
Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi loa o ka nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi kiʻi, aerospace, hoʻopaʻa leo magnetic, paʻi paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā noi ʻē aʻe.E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no ke kumu kūʻai o kēia manawa no ka sputtering targets a me nā mea waiho ʻē aʻe ʻaʻole i helu ʻia.