NiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

ʻO Nickel Aluminum alloy sputtering target e hana ʻia ma o ka hoʻoheheʻe ʻana a me ka metallurgy mana.ʻO ka hui ʻana i ka Aluminum a me Nickel i kahi nui e pono ai e hoʻolako i ka ingot hoʻolei NiAl.ʻOki ʻia ka ingot hoʻolei e hana i ke ʻano i makemake ʻia.Loaʻa iā ia ke kūlike kiʻekiʻe, ka nui o ka palaoa i hoʻomaʻemaʻe ʻia a me ka microstructure homogeneous, me ka ʻole o ke kinoea puff a i ʻole pores.

Ma muli o kāna hui maikaʻi ʻana o ka uhi a me nā mea substrate, ua hana maikaʻi ka uhi NiAl ma lalo o 700 ℃.I kēia manawa, hoʻohana nui ʻia ka NiAl sputtering target i nā lole pale pale, me ka ʻoki ʻana i nā mea hana, nā ʻōpala, nā kaʻa a me nā ʻoihana kūkulu.

ʻO Rich Special Materials he mea hana i ka Sputtering Target a hiki ke hana i nā mea hoʻoheheʻe alumini nikel e like me nā kikoʻī o nā mea kūʻai aku.No ka 'ike hou aku, e 'olu'olu e leka uila mai.