Welina mai i kā mākou mau pūnaewele!

TiAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

ʻO Titanium Aluminum Silika

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

TiAlSi

Huina

ʻO Titanium Aluminum Silika

Maemae

99.5%,99.9%,99.95%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

PM

Nui Loaʻa

L≤2000mm,W≤200mm


Huahana Huahana

Huahana Huahana

ʻO Titanium Aluminum Silicon Sputtering Target Description

ʻO Titanium Aluminum Silicon sputtering target i hana ʻia e ka mana metallurgy.
ʻO Titanium Aluminum Silicon alloy i hoʻohana maʻamau i ka hana ʻana i nā mīkini kaʻa.Loaʻa iā ia ke kūpono kiʻekiʻe kiʻekiʻe a me ke kūpaʻa ʻaʻahu.Hiki i ka hoʻohana ʻana o Ti-Al-Si alloy ke hoʻolōʻihi i ke ola o nā ʻenekini ma kahi o 35%.No kāna noi ʻana i ka huila kaʻa a me ka huila kaʻa, hōʻike ʻo ia i ka maikaʻi o ka castability, machinability, ka luhi luhi a me ka paʻakikī o ka hopena ma mua o A356 Aluminum.

Hiki ke kiʻi ʻia kahi alumini alumini paʻa paʻa wikiwiki ʻia e kahi kaʻina hana paʻa paʻa i kapa ʻia ʻo "melt spinning", kahi e hoʻohua ai i nā waiwai ʻoi aku ka maikaʻi i ka hoʻohālikelike ʻia me ka alumini alumini maʻamau, me ka microstructure fine-grained a ʻoi aku ka maʻalahi o ka alloying.He mea kūpono ia i ka ʻoihana mokulele e hoʻololi i ka alloy base Titanium i hoʻohana ʻia ma 150-300 ℃.

I loko o ke kaʻina hana deposition o nā pahuhopu TiAlSi, hiki ke hoʻokumu ʻia ʻo TiAlSi/TiAlSiN ma ke ʻano he multi-layer o nā papa crystalline kiʻekiʻe me ka nui o nā hale cubic.Ua hana kēia mau mea hoʻoheheʻe multi-layer i kēia mau mea no nā pale paʻakikī e hoʻonui i ke ola o nā mea kani i hoʻohana ʻia no nā kaiapuni paʻakikī.

ʻO Titanium Aluminum Silicon Sputtering Target Packaging

ʻO kā mākou Titanium Aluminum Silicon sputter target ua hōʻailona maopopo ʻia a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi.Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.

Loaʻa i ka Hoʻokaʻaʻike

ʻO ka RSM's Titanium Aluminum Silicon sputtering targets he ultra-high clean and uniform.Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai.Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi loa o ka nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi kiʻi, aerospace, hoʻopaʻa leo magnetic, paʻi paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā noi ʻē aʻe.E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no ke kumu kūʻai o kēia manawa no ka sputtering targets a me nā mea waiho ʻē aʻe ʻaʻole i helu ʻia.


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