Welina mai i kā mākou mau pūnaewele!

WNiFe Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Hao Nikela Tungsten

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

WNiFe

Huina

Hao Nikela Tungsten

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

PM

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

ʻO Tungsten Nickel Iron alloy sputtering target i hana ʻia e ka pauka metallurgy.Loaʻa iā ia ka nui o nā waiwai like ʻole, e like me ke kiʻekiʻe kiʻekiʻe, ductility, a me ka ikaika ʻaʻole i hoʻohālikelike ʻia e nā mea hao ʻē aʻe.ʻO ka maʻamau, ʻo ka ratio ʻo Nickel Iron he 7:3 a i ʻole 1:1.

ʻO Tungsten Nickel Iron alloy nā hiʻohiʻona kiʻekiʻe, ikaika, plasticity, machinability, maikaʻi loa ka wela a me ka conductivity uila, a me ka hiki ke komo i nā kukui x-ray a me γ.Hoʻohana nui ʻia ʻo Tungsten Nickel Iron alloy i ka pale, counterweight, balancing, vibration dampening, temperature tooling applications.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā Tungsten Nickel Iron Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku.No ka 'ike hou aku, e 'olu'olu e leka uila mai.

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