Wholesale Cr Sputtering Target High Purity Thin Film PVD Coating Custom Made Manufacturer and Supplier |Waiwai

Chromium

Cr Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

ʻO ka wehewehe pōkole:

Māhele	Pahu ʻana metala
ʻO ke kimekema	Cr
Huina	Chromium
Maemae	99.9%，99.95%，99.99%
Kinohi	ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau
Kaʻina Hana Hana	PM
Nui Loaʻa	L≤2000mm，W L≤300mm

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

wikiō

ʻO ka wehewehe ʻana o ka Vanadium Sputtering

ʻO Chromium he metala paʻakikī a me ke kala me ke ʻano polū.Loaʻa i ka Chromium maʻemaʻe ka ductility a me ka paʻakikī.He 7.20g/cm3 kona mānoanoa, melting point o 1907 ℃ a me ka paila o 2671 ℃.Loaʻa i ka Chromium ke kūpaʻa corrosion kiʻekiʻe loa a me ka haʻahaʻa haʻahaʻa haʻahaʻa i ka wela kiʻekiʻe.Hoʻokumu ʻia ka metala Chromium ma o ke kaʻina aluminothermic mai ka chrome oxide a i ʻole ka hana electrolytic me ka hoʻohana ʻana i ka ferrochromium a i ʻole chromic acid.

Hiki ke hoʻohana ʻia nā pahu hoʻomaʻemaʻe Chromium sputtering kiʻekiʻe no nā noi maʻamau.ʻO nā uhi i waiho ʻia e nā pahu Chromium e hōʻike ana i ka ikaika nui a me ke ʻano kūʻē.

Hiki iā mākou ke hāʻawi iā Chromium i nā mea maʻemaʻe like ʻole

Pmimi	Ihaumia(ppm)≤
	Fe	Si	Al	C	N	O	S
99.2	3000	2500	2000	200	500	2000	100
99.5	2000	2000	1200	200	500	1500	100
99.7	1200	1000	1000	200	300	1200	100
99.8	1000	800	600	200	200	1000	100
99.9	500	200	300	150	100	500	50
99.95	200	100	100	100	100	300	50

Noi no ka Chromium Sputtering Target

Hoʻohana ʻia ʻo Chromium sputter target i loko o nā noi vacuum he nui e like me nā uhi aniani kaʻa, ka hana kiʻi kiʻi kiʻi kiʻi kiʻi kiʻi, ka hana ʻana i ka pākaukau, ka wahie cell, a me nā mea hoʻonaninani a me ka pale ʻana i ka corrosion.Hoʻohana ʻia ʻo Chromium sputtering target no CD-ROM, hoʻonaninani kiʻiʻoniʻoni ʻoniʻoni, hōʻike papa pālahalaha, ka uhi hana e like me nā ʻoihana ʻoihana mālama ʻike optical, etc.

Hoʻopili ʻia ʻo Chromium Sputtering Target Packaging

Hoʻopaʻa ʻia kā mākou chromium sputter target a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi.Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.

Loaʻa i ka Hoʻokaʻaʻike

Loaʻa ka maʻemaʻe kiʻekiʻe kiʻekiʻe a me ka lole kā RSM's Chromium sputtering target.Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai.Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi loa o ka nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi kiʻi, aerospace, hoʻopaʻa leo magnetic, paʻi paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā noi ʻē aʻe.E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no ke kumu kūʻai o kēia manawa no ka sputtering targets a me nā mea waiho ʻē aʻe ʻaʻole i helu ʻia.