Kumukuai kūpono no 99.99% Purity 4n Copper Nickel CuNi Alloy Sputtering Target no PVD
ʻO Tantalum Niobium
No ka hopena o kā mākou ʻike kūikawā a me ka lawelawe lawelawe, ua lanakila kā mākou ʻoihana i kahi kūlana maikaʻi loa ma waena o nā mea kūʻai aku a puni ka honua no ke kumu kūʻai kūpono no 99.99% Purity 4n Copper Nickel CuNi Alloy Sputtering Target no PVD, Hoʻolaʻa kā mākou hui i ka hoʻolako ʻana i nā manaʻo me ka nui. a me nā hāʻina maikaʻi loa ma ke kumukūʻai kūʻai hoʻokūkū, e ʻoluʻolu ana kēlā me kēia mea kūʻai aku i kā mākou lawelawe.
No ka hopena o kā mākou ʻike kūikawā a me ka lawelawe lawelawe, ua lanakila kā mākou ʻoihana i kahi kūlana maikaʻi loa ma waena o nā mea kūʻai aku a puni ka honua.Kina Copper Target a me Nickel Target, I kēia manawa ua loaʻa iā mākou ka ʻenehana hana kiʻekiʻe, a ʻimi i nā mea hou i nā huahana a me nā hoʻonā.I ka manawa like, ua hoʻonui ka lawelawe maikaʻi i ka inoa maikaʻi.Ke manaʻoʻiʻo nei mākou ʻoiai ʻoe e hoʻomaopopo i kā mākou huahana, pono ʻoe e makemake e lilo i mau hoa me mākou.Ke kali nei i kāu nīnau.
ʻO ka wehewehe ʻana o Tantalum Niobium Sputtering Target
Hana ʻia ka pahuhopu sputtering Tantalum Niobium ma o ka hoʻoheheʻe ʻana o Tantalum a me Niobium.ʻO kēia mau mea ʻelua he wahi hoʻoheheʻe kiʻekiʻe (Tantalum 2996 ℃, Niobium 2468 ℃), wahi hoʻolapalapa kiʻekiʻe (Tantalum 5427 ℃, Niobium 5127 ℃) nā metala liʻiliʻi.ʻO ka Tantalum Niobium alloy ke ʻano like me ke kila, loaʻa iā ia kahi lustre kala-hina (ʻoiai ʻeleʻele ka pauka).Loaʻa iā ia nā waiwai maikaʻi: ke kūpaʻa corrosion, superconductivity, a me ka ikaika wela kiʻekiʻe.No laila hiki i nā noi a i ʻole nā ʻoihana ke pōmaikaʻi mai ka hoʻohana ʻana i nā alloys Tantalum Niobium, e like me ka uila, aniani & optics, aerospace, mea lapaʻau, superconductivity a me ke kila.
He mea koʻikoʻi ʻo Tantalum a me Niobium i ka ʻoihana lewa no nā makahiki ma muli o ko lākou ikaika kupaianaha, ka pale ʻana i ka corrosion a me nā hiʻohiʻona maikaʻi ʻē aʻe, a ua hoʻohana ʻia i nā mea koʻikoʻi e like me nā mīkini rocket a me nā nozzles.
ʻO Tantalum Niobium Sputtering Target Packaging
ʻO kā mākou pahuhopu sputter TaNb ua hōʻailona maopopo ʻia a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi.Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.
Loaʻa i ka Hoʻokaʻaʻike
ʻO ka RSM's Tantalum Niobium sputtering targets he ultra-high clean and uniform.Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai.Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi loa o ka nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi kiʻi, aerospace, hoʻopaʻa leo magnetic, paʻi paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā noi ʻē aʻe.E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no ke kumu kūʻai o kēia manawa no ka sputtering targets a me nā mea waiho ʻē aʻe ʻaʻole i helu ʻia.
No ka hopena o kā mākou ʻike kūikawā a me ka lawelawe lawelawe, ua lanakila kā mākou ʻoihana i kahi kūlana maikaʻi loa ma waena o nā mea kūʻai aku a puni ka honua no ke kumu kūʻai kūpono no 99.99% Purity 4n Copper Nickel CuNi Alloy Sputtering Target no PVD, Hoʻolaʻa kā mākou hui i ka hoʻolako ʻana i nā manaʻo me ka nui. a me nā hāʻina maikaʻi loa ma ke kumukūʻai kūʻai hoʻokūkū, e ʻoluʻolu ana kēlā me kēia mea kūʻai aku i kā mākou lawelawe.
Kumukuai kupono noKina Copper Target a me Nickel Target, I kēia manawa ua loaʻa iā mākou ka ʻenehana hana kiʻekiʻe, a ʻimi i nā mea hou i nā huahana a me nā hoʻonā.I ka manawa like, ua hoʻonui ka lawelawe maikaʻi i ka inoa maikaʻi.Ke manaʻoʻiʻo nei mākou ʻoiai ʻoe e hoʻomaopopo i kā mākou huahana, pono ʻoe e makemake e lilo i mau hoa me mākou.Ke kali nei i kāu nīnau.
